no code implementations • 6 May 2024 • HaoYu Yang, Haoxing Ren
Lithography, transferring chip design masks to the silicon wafer, is the most important phase in modern semiconductor manufacturing flow.
no code implementations • 1 Apr 2024 • Xiaoxiao Liang, HaoYu Yang, Kang Liu, Bei Yu, Yuzhe ma
Optical proximity correction (OPC) is a vital step to ensure printability in modern VLSI manufacturing.
no code implementations • 8 Feb 2024 • HaoYu Yang, Anthony Agnesina, Haoxing Ren
Exploding predictive AI has enabled fast yet effective evaluation and decision-making in modern chip physical design flows.
no code implementations • 25 Mar 2023 • Guojin Chen, HaoYu Yang, Bei Yu
Multiple patterning lithography (MPL) is regarded as one of the most promising ways of overcoming the resolution limitations of conventional optical lithography due to the delay of next-generation lithography technology.
no code implementations • 15 Mar 2023 • Guojin Chen, Zehua Pei, HaoYu Yang, Yuzhe ma, Bei Yu, Martin D. F. Wong
Lithography is fundamental to integrated circuit fabrication, necessitating large computation overhead.
no code implementations • 16 Feb 2023 • Rahul Ghosh, HaoYu Yang, Ankush Khandelwal, Erhu He, Arvind Renganathan, Somya Sharma, Xiaowei Jia, Vipin Kumar
However, these entity characteristics are not readily available in many real-world scenarios, and different ML methods have been proposed to infer these characteristics from the data.
no code implementations • 7 Feb 2023 • Qinghe Gao, HaoYu Yang, Shachi M. Shanbhag, Artur M. Schweidtmann
We thus propose to utilize transfer learning for process design with RL in combination with rigorous simulation methods.
no code implementations • 27 Oct 2022 • Mingjie Liu, HaoYu Yang, Zongyi Li, Kumara Sastry, Saumyadip Mukhopadhyay, Selim Dogru, Anima Anandkumar, David Z. Pan, Brucek Khailany, Haoxing Ren
These synthetic mask images will augment the original limited training dataset used to finetune the lithography model for improved performance.
no code implementations • 8 Jul 2022 • HaoYu Yang, Zongyi Li, Kumara Sastry, Saumyadip Mukhopadhyay, Anima Anandkumar, Brucek Khailany, Vivek Singh, Haoxing Ren
Machine learning techniques have been extensively studied for mask optimization problems, aiming at better mask printability, shorter turnaround time, better mask manufacturability, and so on.
no code implementations • 12 Mar 2022 • HaoYu Yang, Zongyi Li, Kumara Sastry, Saumyadip Mukhopadhyay, Mark Kilgard, Anima Anandkumar, Brucek Khailany, Vivek Singh, Haoxing Ren
Lithography simulation is a critical step in VLSI design and optimization for manufacturability.
no code implementations • 11 Feb 2022 • Xiaowei Jia, Shengyu Chen, Yiqun Xie, HaoYu Yang, Alison Appling, Samantha Oliver, Zhe Jiang
However, the information of released water flow is often not available for many reservoirs, which makes it difficult for data-driven models to capture the impact to downstream river segments.
3 code implementations • 16 Sep 2021 • Guanxiong Chen, HaoYu Yang, Ian M. Mitchell
We introduce ROS-X-Habitat, a software interface that bridges the AI Habitat platform for embodied learning-based agents with other robotics resources via ROS.
no code implementations • 7 Mar 2021 • HaoYu Yang, Shuhe Li, Bei Yu
The activation of lower layer capsules affects the behavior of the following capsules via routing links that are constructed during training via certain routing algorithms.
1 code implementation • 10 Jan 2021 • Guyue Huang, Jingbo Hu, Yifan He, Jialong Liu, Mingyuan Ma, Zhaoyang Shen, Juejian Wu, Yuanfan Xu, Hengrui Zhang, Kai Zhong, Xuefei Ning, Yuzhe ma, HaoYu Yang, Bei Yu, Huazhong Yang, Yu Wang
With the down-scaling of CMOS technology, the design complexity of very large-scale integrated (VLSI) is increasing.
no code implementations • 11 Nov 2020 • Jia Li, HaoYu Yang, Xiaowei Jia, Vipin Kumar, Michael Steinbach, Gyorgy Simon
Electronic Health Records (EHR) data analysis plays a crucial role in healthcare system quality.
no code implementations • 16 Dec 2019 • Haoyu Yang, Wei Zhong, Yuzhe ma, Hao Geng, Ran Chen, Wanli Chen, Bei Yu
VLSI mask optimization is one of the most critical stages in manufacturability aware design, which is costly due to the complicated mask optimization and lithography simulation.
1 code implementation • 12 Dec 2019 • Haoyu Yang, Wen Chen, Piyush Pathak, Frank Gennari, Ya-Chieh Lai, Bei Yu
The tool currently supports both metal layer and via layer generation.
no code implementations • 13 Jul 2018 • Haoyu Yang, Shuhe Li, Cyrus Tabery, Bingqing Lin, Bei Yu
Layout hotpot detection is one of the main steps in modern VLSI design.